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When the HiPIMS is used for magnetron sputtering, the peak current can be as high as 1000 A, resulting in a high ionization rate of the metal target. Due to the short pulse time, the average power applied by HiPIM and the corresponding requirement of cooling are consistent with that of ordinary magnetron sputtering. Therefore, HiPIMS technology combines the advantages of magnetron sputtering and arc ion plating like low temperature deposition, high ionization rate, smooth film surface, strong bonding force and high density of the as-deposited films. In addition，it has significant advantages in controlling the microstructure, reducing the internal stress, enhancing the toughness and improving the flatness of the film.

Since 2008, Xinbo team has taken the lead in investigating the HiPIMS power in China and has independently developed the HiPIMS composite DC power supply. Combined with the pulse and bias synchronization technology of HiPIMS and the characteristics of plasma, the ion atomic ratio during the sputtering process can be precisely adjusted to achieve the controlled growth of a specific film structure.

In customized high-energy pulsed composite power supply, the ultra-high-density plasma generated by high-power pulsed magnetron sputtering technology (HiPIMS) significantly improves the metal ionization rate. Besides, the high sputtering rate of composite DC magnetron sputtering (DCMS) with a fast arc extinguishing (2 μs) controllable composite waveform can flexibly control the ion-to-atomic ratio of the sputtered material and the growth of the film (density and deposition rate).

After cooperating with the self-developed 80K pulse bias power supply, the pulse synchronization between the bias power supply and the HiPIMS power supply can be flexibly adjusted. This results in the precise control of metal ions, avoiding the bombardment of impurity ions on the film, reducing the internal stress of the film and enhancing the toughness of the film.

For special applications in different industries, we can customize different power supply composite waveforms and magnetron sputtering plasma source for customers. From the perspective of materials and the state of the plasma, the whole machine can be customized to provide a complete set of solutions. At present, it has been applied in surface modification, ceramic metallization, low-damage DLC, and cutting edge industries in the medical industry.